A Comparison of Oxide Thickness Measurements of Uranium Dioxide and Tantalum Pentoxide Using Both User-Acquired and Built-In EDS Standards
نویسندگان
چکیده
In this work we describe thickness measurements from oxide layers on uranium and tantalum using Energy Dispersive Spectroscopy (EDS) combined with Oxford Instruments software calculating the layer thickness from measured X-ray intensities. A comparison of the oxide distribution is shown between (1) a user standardised system with an older SDD detector and INCA ThinFilmID and (2) the latest large area SDD detector and the AZtec LayerProbe software using built in standards (i.e. standardless analysis). As system (2) contains significantly improved routines for standardless analysis and better integration with the X-ray acquisition software it reduces the analysis time significantly over system (1).
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